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Description
Develop and finalize production-ready garment patterns and markers for mass manufacturing, optimizing fit, construction, and material yield; digitize, grade, annotate, and validate patterns through samples and test cuts.
  • • Build and fit prototype and pre-production samples to validate patterns.
  • • Annotate patterns with seam allowances, notches, drill marks, pleats, pockets, and attachment points in CAD.
  • • Create markers to maximize fabric yield and advise on layplans and cutting.
  • • Grade patterns across size ranges and maintain size sets and tolerances.
  • • Draft or adapt blocks to production specifications and style intent.
  • • Convert design concepts into production-ready digital and hard patterns.
  • • Print, cut, and verify sample or master patterns and ensure cut accuracy.
  • • Partner with design and technical design to translate specs and prototypes into manufacturable patterns.
  • • Label patterns with size, style, section IDs, grainlines, seam allowances, and sewing notes.
  • • Apply shrinkage, stretch, and ease allowances and compute final dimensions.
  • • Review sketches, samples, and tech packs to determine piece shapes, BOM impacts, and fabric usage.
  • • Prepare durable templates or digitize legacy patterns for production.
  • • Perform test lays and trial cuts to validate markers and cutting instructions.
  • • Input and manage specifications in CAD systems (e.g., Gerber, Optitex, Lectra) for patterning and cutting.
  • • Update patterns after fit sessions and factory feedback, maintaining revision control.
  • • Build or update tech packs with construction details and sewing operations as needed.
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Tasks & skills: O*NET occupational data (work activities, skills, knowledge). Learn more
Sources & Standards: This site includes information from O*NET by the U.S. Department of Labor, Employment and Training Administration (USDOL/ETA), used under the CC BY 4.0 license. Career Clutch has modified some of this information for student readability. USDOL/ETA has not approved, endorsed, or tested these modifications. O*NET® is a trademark of USDOL/ETA.
Last reviewed: Jan 2026
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